Metal Coatings (PVD / Sputtering)

UHV magnetron sputtering systems (S-Series Systems) and sources (APEX and APEX-L Sputter Sources) are offered for demanding applications in industry and for fundamental research where minimal contamination and precise/high growth rates  are required. When atomic Oxygen or atomic Nitrogen is needed for reactive sputtering, DCA has developped state-of-the art solutions (DCAX RF Plasma Source).