Manual Linear Transfer System
UHV Linear Transfer System
Key features
- Easy and reliable transfer up to 4” wafers.
- Base pressure < 3E-10 Torr.
- Modular design allows continuous expansion.
- Integrated sample preparation/degas module allows heating up to 1000°C.
- Bakeable to 200°C.
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More details
The UHV linear transfer system consists of the following modules:
- UHV load lock.
- Transfer module – to the process chamber.
- Preparation/degas module (optional).
- Storage module (optional).
The DCA linear substrate transfer mechanism has been designed to provide easy and reliable substrate transfer between the load lock and any of the process chambers. The substrate transfer is through a UHV buffer chamber which acts as a UHV interface between the load lock and process chambers.
The transfer system includes a movable trolley which can hold up to twelve substrates depending on the substrate size. The trolley runs on a stainless-steel track which extends through the whole load lock/buffer chamber system. The trolley movement is achieved using magnetically coupled rotary drives positioned at regular intervals along the load lock/buffer chamber. The trolley base features a rack and pinion assembly that couples with these rotary drives to provide smooth and reliable transfer throughout the chamber. The DCA transfer system does not use wires or chains inside the vacuum.
UHV load lock features
- Pumping system: Turbo molecular pump (HiPace 80, HiPace 300), Rough pump.
- Pump isolation gate valve (optional).
- Integrated halogen lamp heater – degas samples up to 200°C.
- Vacuum gauging – ion (B-A) gauge and convectron gauge (measurement range atmosphere to E-11).
- VAT manual transfer gate valve (access to linear buffer chamber).
- Nupro vent valve (for quick venting).
- Rotary actuator (magnetically coupled) for sample trolley motion.
- Viton-sealed quick-access door.
Special add-on features
- Combine the linear transfer with the automated transfer system for even greater system flexibility (max. 4” wafers).
- Add a UHV flipping station for in-situ UHV mask/carrier exchange.
- Increase functionality with an analytical port for LEED.
- RF plasma/atom source may be added to the preparation/degas module for surface preparation.
| Base Pressure: | < 3×10-10 Torr |
| Large cryopanel surrounds internal chamber wall | Steel |
| Use temperature | 100-200 °C |
| Weight | 5-10 Kg |
| Delivery time | 2-3 weeks from order |
| Width | 3114mm |
| Width | 3114mm |
| Width | 3114mm |
| Width | 3114mm |
