R-Series
R-Series for Oxide MBE
- Compact chamber designed for high-quality oxide growth on up to 3” wafers.
- Excellent source flexibility with ports for 10 effusion cells, a multi-pocket e-beam source, and an RF plasma.
- Reload or exchange material (for all sources) without venting the growth chamber – perfect for fast-paced research!
DCA stands as a recognized leader in oxide molecular beam epitaxy (MBE), backed by extensive expertise in the field. We understand that research demands innovative processes and customized solutions. Our commitment lies in delivering unique answers to your challenging material applications.
Our R-Series features a compact chamber design ideal for space-constrained research laboratories. Despite its size, it incorporates all necessary ports for sources, analytical components, pumping, and manipulation.
The R-Series is compatible with both manual linear buffer chambers and automated transfer systems. For a straightforward, cost-effective solution, a load lock for direct transfer to the process chamber is also available.
Research groups favor the R-Series for its ability to quickly and easily reload materials without venting the main growth chamber. This capability significantly prolongs growth campaigns, maximizes research output and minimizes the time spent on bakeouts, reserving them only for essential system maintenance.
At the base of the chamber, the differential pumping manifold acts as a separately pumped section of the system. The number of connection ports depends on your source configuration and any analytical components requiring differential pumping, such as RHEED for high gas-flow processes.
Special features
The Electron Beam Module includes a Telemark multi-pocket source (e.g. 4 x 15 cc), flux measurement ports for EIES and Quartz crystal, pocket viewport, linear source shutter (electro-pneumatic), and water-cooled roof. The module can be isolated from the main chamber by a manual VAT CF100 gate valve and connected to the differential pumping module to allow refilling without venting the main chamber.
Each effusion cell module includes a manual CF40 gate valve, linear electro-pneumatic shutter, CF38 all metal right angle valve (connected to the differential pumping manifold), CF16 all metal right angle valve (for venting), CF38 source mounting port, and integrated water-cooling shroud.
Process 4” wafers with a modified source port configuration – contact us for more information.
Specifications
| R450 | |
| Base pressure | < 5 x10-11 Torr / 6 x10-11 mbar |
| Pump configuration | Turbo Molecular Pump (Pfieffer HiPace), Ion Pump, Titanium Sublimation Pump |
| Bakeout temperature | 200°C |
| Electron beam source | CF100 |
| Effusion cell ports | 10 x CF40 |
| RF Plasma | CF63 |
| Differential pumping manifold | Yes (10 /12 CF40 ports) |
| RHEED | CF40 (source), CF63/100 (screen) |
| Vacuum gauging | CF40 |
| Residual gas analyser | CF40 |
| Beam flux monitor | CF63 |
| Quartz crystal monitor | CF63 |
| Optical pyrometer | CF63 |
| Ellipsometry ports | Optional (2x CF40) |
| Atomic absorption ports | Optional (2x CF16) |
| Viewport | CF100 (with manual rotary shutter) |
| Source shutters | Integrated with EC module |
