Magnetron Sputter Source (APEX)

A true UHV magnetron enables the operator to combine other UHV technologies into a larger deposition system with techniques such as MBE, PLD and Surface Analysis. A UHV base pressure also helps to minimise substrate contamination and incorporation of undesirable species into a coating, a key challenge for novel magnetic and quantum devices.  

The APEX magnetron sputter sources are a new generation of bespoke designed UHV high precision sources. For more than 30 years DCA Instruments have specialised in customised UHV thin film systems incorporating an array of deposition sources, including sputtering. Our historical expertise has enabled us to develop a new range of sources designed to meet the needs of the modern researcher exploring new materials systems and developing quantum devices.  

Benefits of Triple Magnet APEX-3i  

• The magnetic field lines above the target are near horizontal for a wider area of the erosion profile. A broad erosion profile, in its turn increases the target utilisation, reducing laboratory costs and venting cycles to replace targets. Typical target usage for APEX-3i is >42%.  
• The diameter of the peak racetrack depth is wider and closer to the edge of the target. The diameter of the peak racetrack depth of APEX-3i is 54 mm, which is much larger than the 46-50 mm in traditional magnetrons. A wider racetrack diameter makes the effective cathode diameter larger and improves film uniformity for a given parameter set.  
• The interaction of the magnets through a ferromagnetic yoke increases the strength of the magnetic field. Through the addition of a second annular magnet field strengths can be boosted for improved thick target or magnetic material performance.