MBE System to KU Leuven

DCA Instruments Delivers Custom MBE Cluster Tool to KU Leuven

DCA Instruments is excited to announce the successful delivery of a first-of-a-kind Molecular Beam Epitaxy (MBE) system to KU Leuven, Belgium, designed specifically for ultra-low particle processing of large-scale optical mirrors on 300 mm/12” silicon wafers. 

Key Features of the MBE System

      • M1000 MBE Process Chamber: Engineered for optimal growth conditions, ensuring high-quality thin films.

      • Central Distribution Chamber (CDC): Equipped with an automated wafer handling robot to streamline operations and minimize contamination.

      • Preparation Chamber: Features a high-temperature heating stage for effective substrate preparation.

      • Storage Cassette: Accommodates up to 10 wafers, enhancing workflow efficiency.

      • Load Lock Interface: Seamlessly integrated with the Equipment Front Entry Module (EFEM) for batch processing.

    Advanced Particle Control

    The Books© EFEM, featuring dual FOUP cassettes, has been fully integrated with the MBE system’s load lock. This innovative design significantly reduces the number of particles entering the UHV system, ensuring the highest growth quality with minimal defects.

    DCA Instruments is proud to support KU Leuven in advancing their research capabilities with this cutting-edge MBE system, reinforcing our commitment to delivering exceptional technology for reliable thin film deposition.

    M1000 Molecular Beam Epitaxy System for ultra-low particle processing, equipped with an Equipment Front Entry Module (EFEM) it is fully compatible with a Teir 1 SEMI-Fab environment.

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